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The
University of California at Santa Barbara (UCSB) and
collaborators introduce a multidisciplinary Center
for Advanced Nitride Electronics, with the objective
of developing a fundamental scientific understanding
of mechanisms governing the noise behavior of wide bandgap
GaN-based transistors and circuits, and methods to exploit
this knowledge to achieve breakthrough performance in
ultra-low-noise electronics for high frequency systems.
The Center's effort encompasses revolutionary new concepts
in materials integration, device physics, and noise
modeling, in concert with established classical methods
of attack, each executed by a superb team of scientists
and engineers. At UCSB (U. Mishra (Director), R. York
(Co-director), S. Denbaars, S. Nakamura, J. Speck, E.Hu),
the California Institute of Technology (A. Hajimiri),
the University of Michigan (J.Singh), Ohio State University
(S. Ringel), Wright State University (D. Look), and
VA Tech (R. Trew). We also anticipate collaborations
with NRAO (M. Pospieszalski) and ARL (W. Caraway) in
microwave noise and phase-noise characterization of
devices/circuits.
The
program is divided into three interlinked thrusts: I)
Materials, Interfaces and Characterization; II)
Device Structures, Processing and Modeling; and
III) Noise Modeling and Circuit
Demonstrations. We will advance HVPE, MOCVD and
MBE growth technologies and employ post-growth high
temperature/high pressure annealing to improve material
quality and reduce point defect density. Surface contributions
to noise are addressed by investigating low damage recess
etching and passivation using conventional dielectrics.
A central feature of our program is a revolutionary
device technology integrating highly polar dielectric
films, to both effectively passivate the Gallium Nitride
surface and enhance the sheet charge in the channel.
Non-polar higher order oxides are being used as gate
dielectrics to produce very high gm devices
essential for low noise. We are examining the fundamental
causes of both phase noise and microwave noise in the
Gallium Nitride system, separating the impact of materials,
device design, circuit topology and sub-system architecture,
using classical and emerging formalisms. Ultra-low phase
noise GaN-based oscillators and power amplifiers, and
low-noise receiver amplifiers, will be demonstrated
and characterized.
Gallium Nitride based transistors offer a unique opportunity
to simultaneously achieve both high power and low microwave
and phase noise from amplifiers. The reason for the high power
is well understood to be the combination of high current and
high voltage available (from AlGaN/GaN HEMTs as an example)
because of the high carrier density and high breakdown fields
in this material system. The recently demonstrated low microwave
noise is a consequence of the low channel sheet resistance
afforded by the structure. Although systematic studies of
phase noise in GaN electronics has yet to be carried out (the
purpose of this program), there is reason for optimism. The
conventional argument for lower phase noise is the promise
of higher linearity in wide bandgap materials afforded by
the larger available I-V space; improved linearity minimizes
the upconversion of 1/f noise into the band of interest, inherently
a nonlinear process. High breakdown voltages also allow for
high power at low quiescent current, minimizing shot noise
contributions. These viewpoints are supported by extensive
empirical data in more conventional materials systems (e.g.
GaAs) where it is found that high breakdown devices-with larger
output impedance and improved linearity-have excellent phase-noise
properties. More recently, advances in quantitative modeling
of phase noise now indicate exactly how the noise conversion
processes relate to physical device and circuit parameters,
and these considerations show unequivocally that devices with
high transconductance and high speed/high mobility are critical
for effective circuit suppression of phase noise. We offer
a top-down and highly integrated research effort aimed at
demonstrating breakthrough results in high-power, low phase-noise
GaN electronics.
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