REPORT
DOCUMENTATION PAGE |
Form
Approved OMB No.
0704-0188 |
|||||
Public
reporting burden for this collection of information is estimated to average 1
hour per response, including the time for reviewing instructions, searching
existing data sources, |
||||||
1. AGENCY
USE ONLY (Leave Blank) |
2. REPORT
DATE 31 Dec 1997 |
3. REPORT
TYPE AND DATES COVERED |
||||
4. TITLE
AND SUBTITLE Non-Cesiated
Solid State Electron Emitters (Cold Cathodes) & Their Applications in Vacuum Microelectronics |
5. FUNDING
NUMBERS DAAH04-95-1-0157 |
|||||
6. AUTHORS Prof. Umesh K. Mishra Robert
D. Underwood |
|
|||||
7. PERFORMING
ORGANIZATION NAME(S) AND ADDRESS(ES) Department of Electrical &
Computer Engineering University of California, Santa
Barbara Santa Barbara, CA 93106 |
8. PERFORMING
ORGANIZATION REPORT NUMBER |
|||||
9. SPONSORING
/ MONITORING AGENCY NAME(S) AND ADDRESS(ES) U.S. Army Research Office P.O. Box 12211 Research Triangle Park, NC 27709-2211 |
10. SPONSORING
/ MONITORING AGENCY REPORT NUMBER 33799-PH |
|||||
11. SUPPLEMENTARY
NOTES The views, opinions and/or findings
contained in this report are those of the author(s) and should not be
construed as an official Department of the Army
position, policy or decision, unless so designated by other documentation. |
||||||
12a. DISTRIBUTION
/ AVAILABILITY STATEMENT Approved for public release;
distribution unlimited. |
12b. DISTRIBUTION
CODE |
|||||
13. ABSTRACT (Maximum
200 words) GaN pyramids have shown promise
as field emission electron sources.
The stable surface and high electron concentration of GaN are advantages
over other materials. The goal of the
past year’s research has been to fabricate field emission devices to
determine the promise of GaN based field emitters to practical vacuum
microelectronic devices. To increase
yield and lower the operating voltage of our cathodes, we reduced the size of
our emitter arrays, and developed a very robust integrated anode
process. The anode is an air-bridge
structure over the emitter tips. Initial measurements of a 10-tip array using
this structure produced emission of 1.5 mA
at 500 V with ~2 mm anode-cathode
separation. The operating voltage is
about half our previous best result with an external anode. Gated GaN field emitter arrays have also
been fabricated. Large arrays showed
shorting problems. An effort has been
made to produce smaller arrays. We have
successfully fabricated smaller arrays that are currently waiting for
measurement. Finally, a method of
using the piezoelectric effect of pseudomorphically strained layers to lower
the surface work function has been studied by simulation and promises even
lower operating voltages of InGaN/GaN field emitters. |
||||||
14. SUBJECT
TERMS GaN, field emitter array, vacuum
microelectronics, integrated anode, piezoelectric effect |
15. NUMBER
OF PAGES 7 |
|||||
pseudomorphic
growth, InGaN |
16. PRICE
CODE |
|||||
17.
SECURITY CLASSIFICATION OF REPORT UNCLASSIFIED |
18.
SECURITY CLASSIFICATION OF THIS PAGE UNCLASSIFIED |
19.
SECURITY CLASSIFICATION OF ABSTRACT UNCLASSIFIED |
20. LIMITATION
OF ABSTRACT UL |
|||
NSN
7540-01-280-5500 |
Standard
Form 298 (Rev. 2-89) Prescribed by ANSI
Std. Z39-1 298-102 |
|||||