REPORT DOCUMENTATION PAGE

Form Approved

OMB No. 0704-0188

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1.   AGENCY USE ONLY  (Leave Blank)

2.   REPORT DATE

      31 Dec 1997

3.   REPORT TYPE AND DATES COVERED

      Interim Progress 1 Jan 1997 - 31 Dec 1997

4.   TITLE AND SUBTITLE

      Non-Cesiated Solid State Electron Emitters (Cold Cathodes) & Their Applications in Vacuum

      Microelectronics

           

5.  FUNDING NUMBERS

     DAAH04-95-1-0157

          

          

6.   AUTHORS

      Prof. Umesh K. Mishra

      Robert D. Underwood

           

          

          

          

          

7.   PERFORMING ORGANIZATION NAME(S) AND ADDRESS(ES)

      Department of Electrical & Computer Engineering

      University of California, Santa Barbara

      Santa Barbara, CA  93106

           

8.  PERFORMING ORGANIZATION REPORT NUMBER

      

          

          

9.   SPONSORING / MONITORING AGENCY NAME(S) AND ADDRESS(ES)

      U.S. Army Research Office

      P.O. Box 12211

      Research Triangle Park, NC  27709-2211

           

10.  SPONSORING / MONITORING AGENCY REPORT NUMBER

     33799-PH

          

          

11.   SUPPLEMENTARY NOTES

      The views, opinions and/or findings contained in this report are those of the author(s) and should not be construed as

      an official Department of the Army position, policy or decision, unless so designated by other documentation.

           

12a.   DISTRIBUTION / AVAILABILITY STATEMENT

           

    Approved for public release; distribution unlimited.

           

           

12b.  DISTRIBUTION CODE

          

          

          

          

13.   ABSTRACT  (Maximum 200 words)

GaN pyramids have shown promise as field emission electron sources.  The stable surface and high electron concentration of GaN are advantages over other materials.  The goal of the past year’s research has been to fabricate field emission devices to determine the promise of GaN based field emitters to practical vacuum microelectronic devices.  To increase yield and lower the operating voltage of our cathodes, we reduced the size of our emitter arrays, and developed a very robust integrated anode process.  The anode is an air-bridge structure over the emitter tips. Initial measurements of a 10-tip array using this structure produced emission of 1.5 mA at 500 V with ~2 mm anode-cathode separation.  The operating voltage is about half our previous best result with an external anode.  Gated GaN field emitter arrays have also been fabricated.  Large arrays showed shorting problems.  An effort has been made to produce smaller arrays.  We have successfully fabricated smaller arrays that are currently waiting for measurement.  Finally, a method of using the piezoelectric effect of pseudomorphically strained layers to lower the surface work function has been studied by simulation and promises even lower operating voltages of InGaN/GaN field emitters.

 

 

 

 

     

     

     

     

     

14.   SUBJECT TERMS

       GaN, field emitter array, vacuum microelectronics, integrated anode, piezoelectric effect

15.  NUMBER OF PAGES

       7

      pseudomorphic growth, InGaN

           

16.  PRICE CODE

            

17.  SECURITY CLASSIFICATION OF REPORT

      UNCLASSIFIED

18.  SECURITY CLASSIFICATION OF THIS PAGE

       UNCLASSIFIED

19.  SECURITY CLASSIFICATION OF ABSTRACT

        UNCLASSIFIED

20.  LIMITATION OF ABSTRACT

       UL

NSN 7540-01-280-5500

Standard Form 298 (Rev. 2-89)

Prescribed by ANSI Std. Z39-1

298-102