| Project: | Magnetron Sputtering Systems for Thin-Film Ferroic Materials |
| Investigators: | Troy Taylor, Pete Hansen, Yutaka Terao, Bob York, Jim Speck |
| Funded by: | U.S. Army Research Office, DARPA FAME |
| Description: For thin-film ferroelectric deposition we have designed and constructed our own dedicated sputtering systems. Our first-generation system was a single-gun on-axis design with a resistive substrate heater. From this we progressed to a second generation magnetron sputtering system (ARO DURIP award, contract DAAD19-99-1-0060) and are in the process of building a third system (DARPA FAME award, DABT63-98-1-0006).  Each
of these newer systems contains four 30º off-axis source ports,
with a maximum target size of 3 inch. Both systems are
equipped with a load-lock and an adjustable source to substrate
distance, and feature quartz lamp heaters with substrate
rotation for improved thickness uniformity. Currently we have
three 600W rf and two 1kW dc power supplies and five rf/dc magnetron
guns. The combination of guns allows us to perform in-situ
electrode deposition, and well as simultaneous deposition from
multiple targets for composition control. The sample-entry
load-locks are inside a portable cleanroom enclosure, which also
contains a laminar flow workbench for sample preparation. We also have
two sample annealing furnaces capable of heating to 1100ºC. |
|